Physical Design and Mask Synthesis for Directed Self-Assembly Lithography(NanoScience and Technology)

材料科学基础学科

原   价:
1807.5
售   价:
1446.00
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平台大促 低至8折优惠
发货周期:外国库房发货,通常付款后3-5周到货
出  版 社
出版时间
2019年02月08日
装      帧
ISBN
9783030094553
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页      码
138
语      种
英文
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图书简介
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
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